CMP - Semiconductors - 亚博ag真人「信誉保障」filtration

CMP Polishing Slurry Filtration Solution

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Accurate Retention Efficiency

Remove defective particles while allowing effective 

particles to pass through

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Nano-fiber Media

Multi-layer Nano-fiber media provides high flow rates
and dirt holding 
capacity

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One-piece Construction

One-piece construction means it's easy to install, clean,
and replace


Strict Japanese quality assurance to ensure 

product stability


Graded Pore Structure

Effectively removes defective particles and high
dirt holding 
capacity

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Patent on Filter Construction Design

Perfectly integrate depth, pleated and rolled
technologies in filter 
design




Keevalid™
Depth Slurry Polishing Filter

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Privalid™
High Flow Rate Slurry Filter

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Provalid™
Patented Construction Filter

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